论文标题
使用统一的调制模式分析（UMPA）模型对X射线波前标记数据的高速处理
High-speed processing of X-ray wavefront marking data with the Unified Modulated Pattern Analysis (UMPA) model
论文作者
论文摘要
波前标记X射线成像技术使用例如砂纸或光栅来产生强度波动，并通过样品分析它们的失真以检索衰减，相抵触和暗场信息。相位造影剂可提高软组织样品的可见性，而深色场揭示了子分辨率结构中的小角度散射。两者都发现了许多生物医学和工程应用。先前开发的统一调制模式分析（UMPA）模型从波前标记数据中提取了这些模式。我们在这里提出了一个新的UMPA实现，能够快速处理大型数据集并具有大大扩展视野的功能。我们还讨论可能的工件和其他新功能。
Wavefront-marking X-ray imaging techniques use e.g., sandpaper or a grating to generate intensity fluctuations, and analyze their distortion by the sample in order to retrieve attenuation, phase-contrast, and dark-field information. Phase contrast yields an improved visibility of soft-tissue specimens, while dark-field reveals small-angle scatter from sub-resolution structures. Both have found many biomedical and engineering applications. The previously developed Unified Modulated Pattern Analysis (UMPA) model extracts these modalities from wavefront-marking data. We here present a new UMPA implementation, capable of rapidly processing large datasets and featuring capabilities to greatly extend the field of view. We also discuss possible artifacts and additional new features.
