论文标题
高平均功率激光等离子体加速度的限制连续流等离子体源
Confined Continuous-Flow Plasma Source For High-Average-Power Laser Plasma Acceleration
论文作者
论文摘要
在过去的几十年中，高功率激光系统的重大进展使激光驱动的等离子体加速器的发展取得了快速的进步。如今，在光束稳定性和可重复性方面获得的结果呈现了激光等离子体加速度，作为传统加速器的可行且有希望的替代方案。由于几个电子束和次要来源的应用需要高平均电流，因此现在重点是增加梁的重复率。在下文中，我们引入了一种新型的KHz电子加速度等离子体来源，提供了连续且空间上限制的气流，同时最大程度地减少了加速室中的气体负荷。
Over the last decades, significant advances in high-power laser systems have enabled rapid progress in the development of laser-driven plasma accelerators. Today, the results obtained in beam stability and reproducibility present laser plasma acceleration as a viable and promising alternative to conventional accelerators. As several electron beam and secondary sources applications require high average currents, a major focus is now on increasing the beam's repetition rate. In the following, we introduce a novel plasma source for kHz electron acceleration, providing a continuous and spatially confined gas flow, while minimising the gas load in the acceleration chamber.
