论文标题

二维钼二硫化物的缺陷工程

Defect Engineering of Two-dimensional Molybdenum Disulfide

论文作者

Chen, Xin, Denninger, Peter, Stimpel-Lindner, Tanja, Spiecker, Erdmann, Duesberg, Georg S., Backes, Claudia, Knirsch, Kathrin C., Hirsch, Andreas

论文摘要

二维(2D)钼二硫化物(MOS2)由于其独特的结构和有趣的特性而在电子和光电应用中具有巨大的希望。 MOS2纳米片的固有缺陷,例如硫磺空位(SV)对设备效率有害。为了减轻此问题,使用硫醇对2D MOS2的功能化已成为工程缺陷的关键策略之一。本文中,我们展示了一种可以控制化学剥落的MOS2纳米片的SV,并使用一系列溶液中的硫酚。可以通过改变硫酚中取代基的电子脱离强度来调整功能化程度。我们发现2LA(M)峰的强度归一化为A1G峰与功能化程度密切相关。我们的结果提供了光谱指标,以监视和量化缺陷工程过程。对于溶液中的MOS2缺陷功能化方法,对于广泛的应用,也有利于对无缺陷MOS2的进一步探索。

Two-dimensional (2D) molybdenum disulfide (MoS2) holds great promise in electronic and optoelectronic applications owing to its unique structure and intriguing properties. The intrinsic defects such as sulfur vacancies (SVs) of MoS2 nanosheets are found to be detrimental to the device efficiency. To mitigate this problem, functionalization of 2D MoS2 using thiols has emerged as one of the key strategies for engineering defects. Herein, we demonstrate an approach to controllably engineer the SVs of chemically exfoliated MoS2 nanosheets using a series of substituted thiophenols in solution. The degree of functionalization can be tuned by varying the electron withdrawing strength of substituents in thiophenols. We find that the intensity of 2LA(M) peak normalized to A1g peak strongly correlates to the degree of functionalization. Our results provide a spectroscopic indicator to monitor and quantify the defect engineering process. This method of MoS2 defect functionalization in solution also benefits the further exploration of defect free MoS2 for a wide range of applications.

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