论文标题
由离子液体门控在二氧化钒中引起的缺陷状态的热电探针
Thermoelectric probe of defect state induced by ionic liquid gating in vanadium dioxide
论文作者
论文摘要
热电测量检测材料中化学电位以上状态的密度之间的不对称性。它提供了对化学电位附近状态密度的微小变化的见解,从而补充了电子传输测量值。在这里,在离子 - 液体(IL)门口下进行了二氧化钒(VO2),在二氧化钒(VO2)上进行抗电能和热电功率测量。使用IL门控,在金属到绝缘体转换(MIT)温度下方的电荷传输保持在热激活状态中,而Seebeck系数则表现出从半导体到金属行为的明显过渡。对比行为表明由于氧缺损状态的形成,IL门控时电子结构的变化。基于融合门控诱导的缺陷带的状态的模型密度,通过数值模拟来证实实验结果。这项研究揭示了热电测量是对IL门控在抑制VO2中的MIT诱导的缺陷状态的方便和灵敏的探针,VO2仍然在电荷传输测量中保持良性,并且可能用于研究其他材料中的缺陷。
Thermoelectric measurements detect the asymmetry between the density of states above and below the chemical potential in a material. It provides insights into small variations in the density of states near the chemical potential, complementing electron transport measurements. Here, combined resistance and thermoelectric power measurements are performed on vanadium dioxide (VO2), a prototypical correlated electron material, under ionic-liquid (IL) gating. With IL gating, charge transport below the metal-to-insulator-transition (MIT) temperature remains in the thermally activated regime, while the Seebeck coefficient exhibits an apparent transition from semiconducting to metallic behavior. The contrasting behavior indicates changes in electronic structure upon IL gating, due to the formation of oxygen defect states. The experimental results are corroborated by numerical simulations based on a model density of states incorporating a gating induced defect band. This study reveals thermoelectric measurements to be a convenient and sensitive probe for the role of defect states induced by IL gating in suppressing the MIT in VO2, which remains benign in charge transport measurements, and possibly for studying defect sates in other materials.